On 1 August the 2025 Advanced Lithography Technology Symposium was held in Suzhou. Hundreds of experts and entrepreneurs from the lithography industry attended more than a dozen in-depth talks on the latest technology, process optimization and future direction of the industry.
A lively event
With the rapid growth of AI, big data, the Internet of Things and 5G, demand for high-performance chips is exploding, and photoresist is a key material for all of them.
INFOR took part throughout with a booth presenting our bead mill technology and applications for the lithography industry. Many guests and companies stopped by, and we established cooperation intentions with several industry experts and companies.
Advantages of INFOR vertical bead mills for lithography materials:
Precise particle size control: particle size control is critical in photoresist production. Vertical bead mills can use zirconia beads as small as 0.03 mm to grind particles to ultrafine nano scale with a uniform distribution, meeting the high-precision requirements of photoresist.
High grinding efficiency: advanced grinding and separation technology, with high-speed rotating discs driving the media, reduces particle size to nano scale in a short time. Compared with conventional equipment, grinding time can be several times shorter and productivity significantly higher.
Good heat dissipation: grinding generates a lot of heat, which degrades photoresist if not removed. An efficient cooling system keeps the process at a stable temperature, improving quality and extending equipment life.
Contamination-free design: photoresist requires an extremely clean production environment, and even tiny contamination lowers quality. A fully enclosed grinding chamber and advanced sealing keep external impurities out, and the motion path of media and photoresist is designed to avoid contact with other parts, further reducing contamination.
Easy cleaning and maintenance: a well-designed structure with automatic lifting makes internal parts easy to remove and clean, so residues are cleared quickly and thoroughly, and maintenance is simple.
Intelligent control: advanced sensors and control systems let operators monitor and adjust all grinding parameters in real time for stable, consistent production, while the system monitors and diagnoses machine condition to find and solve potential problems early.
As semiconductor processes move to ever smaller nodes, photoresist requirements keep rising. The efficient grinding and precise control of INFOR vertical bead mills help photoresist meet higher technical standards in support of chip development.
Innovation and growth
INFOR has long invested R&D in photoresist grinding, has completed high-standard development work with several companies and has production cooperation with several industry leaders with excellent results. As technology advances, INFOR vertical bead mills will continue to grow together with the photoresist industry.